Preparation of Rhombohedral Boron Phosphide Wafer by CVD Process

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-06-30

著者

• Kumashiro Yukinobu

  Department Of Engineering Yokohama National University

• YOSHIZAWA Harumi

  Department of Engineering, Yokohama National University

• Shirai Koun

  Institute Of Science And Industrial Research Osaka University

• Yoshizawa Harumi

  Department Of Engineering Yokohama National University

関連論文

• Substrate Temperature Dependence of the Surface Reaction Mechanism of Methane Plasma Chemical Vapor Depositon : Experimental and Ab Initio Molecular Orbital Study
• Heteroepitaxial Growth of Boron Phosphide Single Crystal on Sapphire Single Crystal
• Electoronic Structure of BP Studied by Resomant Soft X-Ray Emission Spectroscopy
• Preparation of Rhombohedral Boron Phosphide Wafer by CVD Process
• Semiconducting Properties of Boron Phosphide Thin Films by MBD Process

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