Superconducting Transition Temperatures of V_3Si Films Formed by Reactive Diffusion

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1987-06-20

著者

• Usami Kouichi

  The University Of Electro-communications Dept. Of Electronic Engineering

• Usami Kouichi

  The University Of Electro-communications

• Goto Toshinari

  The University Of Electro-communications

• TSURUMI Tatsuo

  The University of Electro-Communications

関連論文

• Self organized Micro Cones on Si substrate by Microwave Plasma Chemical Vapor Deposition
• Superconducting Transition Temperatures of V_3Si Films Formed by Reactive Diffusion
• I-V Characteristics of NbN-NbN Josephson Point Contacts : Electrical Properties of Condensed Matter
• Fabrication and Properties of Nb Variable-Thickness Bridge Array
• Josephson Effects in Niobium Variable-Thickness Bridges
• Fabrication of NbN Films by dc Bias Sputtering and Their Application to Superconducting Bridges
• Mutual Inductance Coupled through Superconducting Thin Film in Niobium Josephson Integrated Circuits

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