Stability as Regards Film Thickness, Homogeneity and Optical Properties of Thin a-Si:H Films

概要

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The instability, or other words, the spontaneous changes in the properties of the material (ageing) that occur in thin a-Si:H films in the atmosphere in the long term have been determined as a function of the preparation parameters-pressure, power, gas flow rate and substrate temperature. The repeated monitoring of the material properties of the original films required the use of a non-destructive technique. The chosen technique encompassed the obtaining of transmission spectra of the film-substrate configuration and from this the film thickness, the homogeneity parameter ⊿d and the optical properties, n(λ), α(λ) and E_0 were obtained. Of the four preparation parameters that were varied, substrate temperature played a dominant role as regards the material properties and stability of these films. Experimental results of a number of films that were deposited at temperatures equal to, or lower than room temperature consistantly underwent the following changes in the long term: increases in film thickness and E_0, and decreases in the values of the parameters ⊿d, n(λ) and α(λ). The effect of ageing, as seen from the results, was not only restricted to the surface, but appeared throughout the whole thickness of the film.
社団法人応用物理学会の論文
1987-03-20