A Planarization Technique Utilizing Oxide Flow during H_2 Treatment of a SiO_2-GeO_2 Film
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1986-07-20
著者
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Amemiya Yoshihito
Ntt Atsugi Electrical Communications Laboratories Nippon Telegraph And Telephone Corporation
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OGINO Toshio
NTT Atsugi Electrical Communications Laboratories, Nippon Telegraph and Telephone Corporation
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Ogino Toshio
Ntt Atsugi Electrical Communications Laboratories Nippon Telegraph And Telephone Corporation