Exposure Method Using Photoresist Mask for High-Density Optical Disk Mastering

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概要

著者

Shimizu A
Department Of Electrical And Electronic Engineering Faculty Of Engineering Toyama University
Obara Takashi
Corporate Manufacturing Engineering Center Toshiba Corporation
Obara Takashi
Od Development Center Research And Development Group Ricoh Company Ltd.
Shimizu Akihiko
Od Development Center Research And Development Group Ricoh Company Ltd.
Hashiguchi Tsuyoshi
Od Development Center Research And Development Group Ricoh Company Ltd.
ENDO Hideyasu
OD Development Center, Research and Development Group, Ricoh Company, Ltd.
WATANABE Hisao
OD Development Center, Research and Development Group, Ricoh Company, Ltd.
MIYATA Hiroyuki
OD Development Center, Research and Development Group, Ricoh Company, Ltd.
MIZUTA Osamu
OD Development Center, Research and Development Group, Ricoh Company, Ltd.
TAKEUCHI Koji
OD Development Center, Research and Development Group, Ricoh Company, Ltd.
KUDO Yuzuru
OD Development Center, Research and Development Group, Ricoh Company, Ltd.
Kudo Yuzuru
Od Development Center Research And Development Group Ricoh Company Ltd.
Mizuta Osamu
Od Development Center Research And Development Group Ricoh Company Ltd.
Endo H
Od Development Center Research And Development Group Ricoh Company Ltd.
Miyata Hiroyuki
Od Development Center Research And Development Group Ricoh Company Ltd.
Watanabe Hisao
Od Development Center Research And Development Group Ricoh Company Ltd.
Takeuchi Koji
Od Development Center Research And Development Group Ricoh Company Ltd.

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