Evaluation of LB Films as Quarter Micron Lithography Resists Using Excimer Laser, X-Ray, and Electron Beam Exposure : Techniques, Instrumentations and Measurement

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1988-05-20

著者

• Ogawa Kazufumi

  Semiconductor Research Center Matsushita Electric Ind. Co. Ltd.

関連論文

• A New Photobleachable Positive Resist for KrF Excimer Laser Lithography : Advanced III-V Compound Semiconductors and Silicon Devices(Solid State Devices and Materials 1)
• A KrF Excimer Laser Lithography for Half Micron Devices : Techniques, Instrumentations and Measurement
• Evaluation of LB Films as Quarter Micron Lithography Resists Using Excimer Laser, X-Ray, and Electron Beam Exposure : Techniques, Instrumentations and Measurement
• Spectroscopic Evaluation on Photosensitive Langmuir Films Using Multichannel Spectrophotometer : Techniques, Instrumentations and Measurement

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