Investigation of Pulsed Laser Removal of Cr and MoSi Film on a Quartz Substrate

概要

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Cr and MoSi film removal from a quartz substrate was investigated using a Nd:YAG laser repair system with a wavelength of 532 nm and pulse duration of 4 ns. Characteristics of the debris, removal size, and transmittance were clarified from the results of scanning electron microscope (SEM) observation and optical measurements. The debris resulting from Cr and MoSi removal consisted of spherical particles and pulverized powder, respectively. The difference in removal size between Cr and MoSi was consistent at about 200 nm. In order to obtain the optimum optical transmittance, it was found that the laser energy required for Cr removal is 1.45 times higher than that required for MoSi removal. An approximate formula for estimating the actual laser energy required was proposed. The actual laser energy was estimated to be 1/500 in comparison with the operational energy measured using an in-house power monitor. An ablation model for the removal mechanism based on melting and vaporization was constructed. The saturated formula was in agreement with the results of experiments.
社団法人応用物理学会の論文
1999-12-15