Characteristics of the Electric Capacitance and Dielectric Loss of the Thermal Oxide of Porous Silicon Formed Using Highly Phosphorus Diffused Silicon

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-03-15

著者

• Arita Yoshinobu

  Ntt System Electronics Laboratories

• KURANARI Kunihiro

  MAKI Hospital

• Kuranari K

  Maki Hospital

関連論文

• Characteristics of the Electric Capacitance and Dielectric Loss of the Thermal Oxide of Porous Silicon Formed Using Highly Phosphorus Diffused Silicon
• Dislocation-Free Oxidation of Porous Silicon Formed Using Highty Phosphorus-Diffused Silicon and Its Application

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