Microstructure and Temperature Coefficient of Resistance of Platinum Films

概要

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Platinum thin films are prepared on alumina ceramic substrates by rf magnetron sputtering. Microstructure and morphology are found to be sensitive to the sputtering gases and substrate surface conditions. N_2-sputtered films show better microstructure quality than Ar-sputtered ones for use in forming industrial platinum resistance thermometers (IPRTs). The preferred (111) orientation in both as-deposited and recrystallized Pt films are identified using X-ray diffraction analysis. Thin-film Pt resistance thermometers are fabricated by laser beam trimming. The values of temperature coefficient of resistance (TCR) for N_2-sputtered films show values close to the desired IPRT specification of 3850 ppm/℃ and increase proportionally to the film's thickness. The dependence of microstructure and TCR on various heat treatment conditions is also investigated.
社団法人応用物理学会の論文
1997-02-15