Change in UV Transmittance in Silica Photomask Glass under KrF Excimer Laser Irradiation

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概要

• 論文の詳細を見る

• Change in optical transmittance of silica photomask glass, synthesized by flame hydrolysis of SiCl_4, was measured in situ under KrF exima laser irradiation. Photoabsorbance at 215 nm has a peak at 2-3×10^3 pulse irradiation. The transmittance after cessation of the irradiation recovers having two relaxation times of approximately 10 and 100 s. The maximum absorbance decreases with increasing OH content in the glass. The 0.4th power dependence of the absorbance on the laser power density (frequency×intensity) is explained by assuming that the saturated absorbance is proportional to the degree of the E' center formation reaction, and is reciprocal to that of the OHC related 1.9 eV photoemission reaction.

• 社団法人応用物理学会の論文
• 1995-10-15

著者

• Shimbo M

  National Cancer Center Hospital East

• SHIMBO Masaru

  Toshiba Ceramics Co., Ltd.

• SATO Kenichi

  Toshiba Ceramics Co.

関連論文

• Photoabsorption of Synthetic Silica Glass under ArF Excimer Laser Irradiation : Optical Properties of Condensed Matter
• Estimation of the Life of Synthetic Silica Glass under Long Time Irradiation by ArF Excimer Laser
• Change in UV Transmittance in Silica Photomask Glass under KrF Excimer Laser Irradiation

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