Patterning of 2 -10 Nanometer-Scale Plasma-Polymerized Organic Films by Atomic Force Microscope

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概要

• 論文の詳細を見る

• Ultrathin films of 2-10 nm thickness were deposited by pulsed discharge plasma polymerization. The film surface topography was studied by an atomic force microscope (AFM), which showed that the films are smooth and pinhole-free. The AFM was used to produce nanometer-scale indentations/holes in these deposited ultrathin organic films. The patterning process is governed by several factors: mechanical and Coulomb forces, heat effects,material transfer, and electric charge deposition depending on the conditions. The patterning results indicate the AFM can be used for the formation of nanometer-scale structures.

• 1994-11-15

著者

• Vinogradov G

  Nagoya Univ. Nagoya Jpn

• VINOGRADOV Georgy

  Center for Cooperative Research in Advanced Science and Technology, Nagoya University

• GORWADKAR Sucheta

  Center for Cooperative Research in Advanced Science and Technology, Nagoya University

• SENDA Kenji

  Center for Cooperative Research in Advanced Science and Technology, Nagoya University

• MORITA Shinzo

  Center for Cooperative Research in Advanced Science and Technology, Nagoya University

• Senda K

  Yamaguchi Univ. Yamaguchi Jpn

• Gorwadkar Sucheta

  Center For Cooperative Research In Advanced Science And Technology Nagoya University

• Morita Shinzo

  Center For Cooperative Research In Advanced Science And Technology Nagoya University

関連論文

• Patterning of 2 -10 Nanometer-Scale Plasma-Polymerized Organic Films by Atomic Force Microscope

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