An Improved Preparation Method of Ultrafine Particles by Gas Evaporation with Arc Plasma Sputtering

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概要

• 論文の詳細を見る

• A preparation method of metallic ultrafine particles by means of arc plasma sputtering was improved so as to be applicable to various materials including semiconductor materials. A higher production rate of ultrafine particles was achieved, for example, 380 mg/min, 420 mg/min and 230 mg/min for iron, silver and silicon, respectively.

• 社団法人応用物理学会の論文
• 1991-08-15

著者

• Oya H

  General Education Suzuka Technical College

• OYA Hiroo

  General Education, Suzuka Technical College

関連論文

• An Improved Preparation Method of Ultrafine Particles by Gas Evaporation with Arc Plasma Sputtering
• Nonlinear Lattice Vibration Appearing at Low Temperatures in Silver Ultrafine Particles with Static Distortion

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