The Method of Measuring Optical Performance in KrF Excimer Lithography

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概要

• 論文の詳細を見る

• The theoretical meaning of the ratio of top width to bottom width of a resist pattern (T/B) is explained by a simple model. In KrF excimer lithography, the positive photoresist, FH-EX1, is suitable for T/B evaluation. The method of measuring the optical performance of the projection optical systems using T/B is introduced. The response data of T/B for defocus, dose, the normalized spatial frequency and the illumination/projection condition are shown. In addition, with application of the result of the optimization of the illumination/projection corndition by T/B evaluation to the exposure of the chemical amplification resist, it is shown that sufficient depth of focus for 0.35 μm line and space patterns can be obtained.

• 社団法人応用物理学会の論文
• 1992-12-30

著者

• Suzuki Kazuaki

  System Designing Section 1st Designing Department Industrial Supplies & Equipment Division Nikon

• MATSUM0TO Yukako

  System Designing Section, 1st Designing Department, Industrial Supplies & Equipment Division, Nikon

• MURAYAMA Masayuki

  System Designing Section, 1st Designing Department, Industrial Supplies & Equipment Division, Nikon

• Matsum0to Yukako

  System Designing Section 1st Designing Department Industrial Supplies & Equipment Division Nikon

• Murayama Masayuki

  System Designing Section 1st Designing Department Industrial Supplies & Equipment Division Nikon

関連論文

• The Method of Measuring Optical Performance in KrF Excimer Lithography

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