Effects of Oxygen Addition in the CCl_4 Reactive Ion Etching of a-SiC:H Films
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-12-15
著者
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Huang H‐c
Hong Kong Univ. Sci. And Technol. Hkg
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LO Tai-chin
Microelectronics Fabrication Centre, Department of Electrical and Electronic Engineering, The Hong K
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HUANG Ho-chi
Microelectronics Fabrication Centre, Department of Electrical and Electronic Engineering, The Hong K
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Lo T‐c
Hong Kong Univ. Sci. And Technol. Hkg