Factors Controlling Pretilt Angles of Polyimide Alignment Film for Liquid Crystal Displays
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-09-30
著者
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Nozaki Chiharu
Advanced Semiconductor Devices Research Laboratories R&d Center Toshiba Corporation
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Nozaki C
Advanced Semiconductor Devices Research Laboratories R&d Center Toshiba Corporation
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NOZAKI Chiyoshi
Fujinomiya Laboratory, Fuji Photo Film Co., Ltd.
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IMAMURA Naoya
Fujinomiya Laboratory, Fuji Photo Film Co., Ltd.
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SANO Yasuhisa
Fujinomiya Laboratory, Fuji Photo Film Co., Ltd.
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Imamura N
Fujinomiya Laboratory Fuji Photo Film Co. Ltd.
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Sano Yasuhisa
Fujinomiya Laboratory Fuji Photo Film Co. Ltd.
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Imamura Naoya
Fujinomiya Laboratory Fuji Photo Film Co. Ltd.
関連論文
- Reactive Ion Beam Etching and Overgrowth Process in the Fabrication of InGaN Inner Stripe Laser Diodes
- Reactive Ion Beam Etching and Overgrowth Process for Fabrication of InGaN Inner Stripe Laser Diodes
- Factors Controlling Pretilt Angles of Polyimide Alignment Film for Liquid Crystal Displays