Influence of Reaction Products on Si Gate Etching with a Photoresist Mask in HBr/O_2 and Cl_2/O_2 Electron Cyclotron Resonance Plasma
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- 社団法人応用物理学会の論文
- 1993-03-15
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- Influence of Reaction Products on Si Gate Etching with a Photoresist Mask in HBr/O_2 and Cl_2/O_2 Electron Cyclotron Resonance Plasma