Temperatures during Vacuum Deposition of Metal Films

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概要

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• The radiant energy from a growing Ag film evaporated on a thin formvar substrate was analyzed spectroscopically by means of infrared filters. The ratios of transmitted energies through the filters to unfiltered energies (R.T) from the film were compared with those obtained from a resistance-heated Ag plate. For films less than about 250Å (≡d_0) in average thickness the film temperature can not be defined uniquely, and in films thicker than d_0 the temperature decreases accompanied by a fluctuation as thickness increases. The amount of radiant energy decreases with an increase in residual gas pressure, and the R.T's decrease or remain unchanged for films less than or larger than d_0 in thickness. These results are discussed on the basis of the free electron theory.

• 社団法人応用物理学会の論文
• 1969-02-05

著者

• Yoda Eiji

  Kyoto Technical University

関連論文

• On the Elastic Scattering of Electrons observed in Kikuchi Patterns
• Total Emissivity of Ag Films
• Temperatures during Vacuum Deposition of Metal Films

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