The Properties of the Interface between Gallium Arsenide and Silicon Oxides

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概要

• 論文の詳細を見る

• The MOS characteristics of gallium arsenide were investigated using silicon monoxide and dioxide as insulators. The band scheme was nearly flat at the surface of gallium arsenide covered by these oxides. At the interface, there were several kinds of surface state whose levels were located at 0.05, 0.2, 0.4, 0.55 and 0.65 eV below the conduction band edge respectively. Densities of these states were estimated as about 2∼5×10^<11>/cm^2.

• 社団法人応用物理学会の論文
• 1968-06-05

著者

• Sato Yasuo

  The Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

関連論文

• The Properties of the Interface between Gallium Arsenide and Silicon Oxides

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