Effect of Metal-Semiconductor Work Function Difference on the Calculation of Surface Charge Density of Silicon-Silicon Dioxide Interface
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1966-06-15
著者
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Mehta R.
Itt Semiconductors Product Laboratory International Telephone And Telegraph Corporation Palo Alto
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Coppen P.
ITT Semiconductors Product Laboratory International Telephone and Telegraph Corporation, Palo Alto
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Heynes M.
ITT Semiconductors Product Laboratory International Telephone and Telegraph Corporation, Palo Alto
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Heynes M.
Itt Semiconductors Product Laboratory International Telephone And Telegraph Corporation Palo Alto
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Coppen P.
Itt Semiconductors Product Laboratory International Telephone And Telegraph Corporation Palo Alto