Enhanced Step Coverage of SiO_2 Films Sputtered in Hydrogen-Argon Mixed Gas

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概要

• 論文の詳細を見る

• Step coverage of magnetron sputtered SiO_2 films prepared in 30% hydrogen-70% argon mixed gases has been investigated in comparison with that in argon only. The following results were obtained. (1) In pure argon, the step coverage profile has a vertical slope with microcrack at the step. (2) By mixing hydrogen in argon, step coverage is improved to a positive slope profile without microcracks, and the film at the step is densified.

• 社団法人応用物理学会の論文
• 1980-05-05

著者

• Serikawa Tadashi

  Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

関連論文

• Enhanced Step Coverage of SiO_2 Films Sputtered in Hydrogen-Argon Mixed Gas

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