Cross-Over Interconnections in P-MOS Integrated Circuits Using Two-Photomask Process

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1977-08-05

著者

• SHOHNO Katsufusa

  Faculty of Science and Technology, Sophia University

• Hirayama Makoto

  Faculty Of Science And Technolgy Sophia University

• Hirayama Makoto

  Faculty Of Science And Technology Sophia University

• Shohno Katsufusa

  Faculty Of Science And Technology Sophia University

関連論文

• Free Boron Monophosphide Wafers
• 47-Stage P-MOS Ring Oscillator Circuit Using the Two-Photomask Fabrication Process
• Cross-Over Interconnections in P-MOS Integrated Circuits Using Two-Photomask Process
• Hardness of Epitaxially Grown Rhombohedral Boron Phosphide

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