Effects of Bias Application on C-V Characteristics in MA(O)S Structures
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概要
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Effect of bias application on capacitance-voltage (C-V) characteristics in metal-aluminum oxide-(silicon dioxide)-silicon (MA(O)S) structures is investigated. Broadening or distortion of C-V characteristics is often observed after a negative bias application to the electrode. Change of C-V characteristics with applied negative bias voltage is divided into four regions related to the partial injection of electrons and holes into the film. Electron injection into the film depends on the properties of the electrode-aluminum oxide film interface, and holes are injected in amount corresponding to the magnitude of the electric field changed by the distribution of electrons stored in the film.
- 社団法人応用物理学会の論文
- 1973-06-05