Properties of Ta_2O_5-Al_2O_3 Mixture Films
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概要
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Mixture films of Ta_2O_5 and Al_2O_3 deposited by means of hydrolysis in the temperature range of 800-900℃ are studied. Structural, optical, physico-chemical and dielectrical characteristics of the mixture films are measured, yielding the following results ; (a) the film structure is amorphous, when the weight ratio of Ta_2O_5 in the films is about 0.05 to 0.5, (b) the film can be etched by NH_4F acid solution, (c) the values of the optical energy gap are range between 5.50 to 4.42, (d) dielectric constants of the films range from 11 to 16, and one frequency independent, (e) the dielectric strength of this films is about 5×10^6 V/cm. The d-c conductivity of the films is investigated and an activation energy of 0.64 eV is obtained from the slope of the log J vs. 1/T plot, and the barrier height φ_1 is found to be 1.3 eV.
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- 1973-12-05