Switching Behaviors of Electrodeposited Nickel-Iron Thin Films

概要

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In this paper are described the experimental results of magnetic flux reversal by partial switching in 80Ni-20Fe thin films electrodeposited onto copper plates. The flux reversal was realized by means of pulsive magnetic fields, whose rise time are perpendicular to a driving wire. The dependence of the swithing time and the output voltage on driving field intensities and on the direction of the field relative to the magnetic easy axis were studied. A possibility of high-speed switching nearly in 1 nsec has been proved, which is equivalent to that of films evaporated onto glass substrates. It has also been found from the studies of the swithching characteristics of electrodeposited films from 2100Å up to 16800Å thick that there exist an optimal film thickness which give a high level output and a fast switching, and that the optimal film thickness which give a high level output and a fast switching, and that the optimal thickness depends upon the rise time of driving pulse. The effect of eddy current damping on the switching phenomenon is also discussed.
社団法人応用物理学会の論文
1963-11-15