9.5 Improvement of p-Si film quality and p-Si TFT characteristics by Application of Large-Area ELA Technology(1.Active-Matrix Technologies I, II)(20th IDRC report)
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概要
- 論文の詳細を見る
- 社団法人映像情報メディア学会の論文
- 2000-11-10
著者
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Prat C.
Sopra Inc.
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Prat C.
Sopra
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Voutsas A.T.
Sharp Labs of America, Inc.,
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Zahorski D.
Sharp Labs of America, Inc.,
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Zahorski D.
Sharp Labs Of America Inc.
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Voutsas A.t.
Sharp Labs Of America Inc.
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Prat C.
Sharp Labs of America, Inc., /SOPRA Inc.
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Prat C.
Sharp Labs Of America Inc. /sopra Inc.
関連論文
- 14-6 200ns-Excimer-Laser Pulse : a Way Toward Optimization of the Crystallization of Amorphous Silicon for Flat Panel Display Applications(4.Session 14:AMLCD 2)
- 9.5 Improvement of p-Si film quality and p-Si TFT characteristics by Application of Large-Area ELA Technology(1.Active-Matrix Technologies I, II)(20th IDRC report)