32.2: The Development of Super-High Aperture Ratio with Low Electrically Resistive Material for High-Resolution TFT-LCDs(Session 32 : Manufacturing of a-Si AMLCDs)(発表概要)(Report on 1999 SID International Symposium)
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概要
- 論文の詳細を見る
- 社団法人映像情報メディア学会の論文
- 1999-07-02
著者
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Hirobe T.
Sharp Corp.
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Nakabu S.
Sharp Corp.
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Yano K.
Sharp Corp.
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Katayama M.
Sharp Corp.
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Tarui T.
Sharp Corp.
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Hibino Y.
Sharp Corp.
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Voutsas T.
Sharp Microelectronics Technology
関連論文
- 32.2: The Development of Super-High Aperture Ratio with Low Electrically Resistive Material for High-Resolution TFT-LCDs(Session 32 : Manufacturing of a-Si AMLCDs)(発表概要)(Report on 1999 SID International Symposium)
- 16.5 An Amorphous-Si TFT-Addressed 3.2-in. Full-Color LCD (Report on 1986 SID International Symposium)