Pigment-dispersed Color Resist with High Resolution for Advanced Color Filter Application (第5回日韓台中情報ディスプレイ合同研究会(ASID '99)) -- (Displays Materials)
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概要
- 論文の詳細を見る
A positive working pigment-dispersed color resist comprising organic pigments and a chemically amplified resist system is designed for high resolution color filter with fine patterns of less than 5 μm lines and spaces. It also shows high brightness and good color reproducibility. An acrylic binder including acid labile group and aromatic function group that have both functions of acid catalysed unblocking and good compatibility with pigments is also synthesized.
- 社団法人映像情報メディア学会の論文
- 1999-03-19
著者
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Wu Jung
Itri
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Cheng Tzong
Associate Researcher Materials Research Lab./itri
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Fan Jr
Associate Researcher Materials Research Lab./itri
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Lee Rong
Materials Research Lab.lTRI
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Fan Jr
Materials Research Lab.lTRI
-
Cheng Tzong
Materials Research Lab.lTRI
-
Wu Jung
Materials Research Lab.lTRI
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Lee Rong
Associate Researcher Materials Research Lab./ITRI
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Lee Rong-Jer
Materials Research Lab.lTRI
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Fan Jr-Cheng
Materials Research Lab.lTRI
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Cheng Tzong-Shing
Materials Research Lab.lTRI
関連論文
- Pigment-dispersed Color Resist with High Resolution for Advanced Color Filter Application (第5回日韓台中情報ディスプレイ合同研究会(ASID '99)) -- (Displays Materials)
- Pigment-dispersed Color Resist with High Resolution for Advanced Color Filter Application