Relationship between Microstructure and Magnetization Process in Sputter-Deposited Co/Pd Multilayers
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概要
- 論文の詳細を見る
Ultrathin Co/Pd multilayered films were prepared by rf magnetron sputtering and the effects of deposition conditions such as sputtering gas pressure and palladium underlayer thickness on the perpendicular magnetic characteristics of the multilayer were investigated. It was found that predominant mode of magnetic reversal changed from domain wall motion to magnetic moment rotation as sputtering gas pressure increased. Palladium underlayer also influenced the magnetization reversal features, and contribution of magnetic rotation to the magnetic reversal increased as palladium underlayer thickness increased. It turned out that there existed an optimum pressure for maximum perpendicular anisotropy energy, and the pressure was lower for the film with thinner cobalt layer.
- 社団法人映像情報メディア学会の論文
- 1994-11-18
著者
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Joo Seung-ki
Dept. Of Metall. Eng. Seoul National University
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Joo Seung-ki
Dept. Metallurgical Engineering Seoul National University
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Oh Hoon-sang
Dept. Of Metallurgical Engineering Seoul National University
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Oh Hoon-sang
Dept. Metallurgical Engineering Seoul National University
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