Fabrication of Sub-100 nm Linewidth Grating Patterns Using Nanoimprint Lithography(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
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概要
- 論文の詳細を見る
Nanoimprint Lithography (NIL) is a promising technology enabling the fabrication of nanoscale patterns with low cost. In order to be a mainstream lithography NIL should overcome the current technical limitations, which will take several years. However, a state-of-the-art NIL can find a short-term application in nano-structured optical devices and bio-devices, where the multiplayer process is not required. As one of working examples of applying NIL to the nanostructured optical devices, fabrication of sub-100 nm line-width grating patterns is described in this manuscript with a particular emphasis on the nanowire polarizer.
- 社団法人電子情報通信学会の論文
- 2004-06-25
著者
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Park Joo-do
Devices & Materials Lab. Lg Electronics Institute Of Technology
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Kim J‐s
Devices & Materials Lab. Lg Electronics Institute Of Technology
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AHN Seh-Won
Devices and Materials Laboratory, LG Electronics
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Lee Ki-Dong
Devices & Materials Lab., LG Electronics Institute of Technology
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Kim Jin-Sung
Devices & Materials Lab., LG Electronics Institute of Technology
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Lee Ki-dong
Devices & Materials Lab. Lg Electronics Institute Of Technology
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Ahn Seh-won
Devices & Materials Lab. Lg Electronics Institute Of Technology
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- Fabrication of Sub-100 nm Linewidth Grating Patterns Using Nanoimprint Lithography(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
- Fabrication of Sub-100 nm Linewidth Grating Patterns Using Nanoimprint Lithography(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))