High Quality Field Emission from Carbon Films Deposited on Low Cost Substrate Materials

概要

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For many large area display applications(greater than 40" diagonal), low cost substrate materials are required. Until recently, carbon film cathodes were deposited on Si wafers or ceramic substrates, which are impractical for large area applications. We recently developed processes for depositing carbon films on inexpensive substrates such as glass and steel, which demonstrate excellent field emisson qualities for display applications. These carbon films achieve emission current densities of over 40mA/cm^2 al fields of less than 〜 6V/micron, with good uniformity, sufflcient for many display applications. This paper presents and discusses the results.
社団法人電子情報通信学会の論文
2000-10-13