Design and Development of 3-Dimensional Process Simulator (Special Issue on TCAD for Semiconductor Industries)

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概要

• 論文の詳細を見る

• Design concepts and backgrounds of a 3-dimensional semiconductor process simulator are presented. It is designed to become a basis of developing semiconductor process models. An input language is designed to realize flexibly controlling simulation sequence, and its interpreter program is designed to accept external software to be controlled and to be integrated into a system. To realize data-exchanges between the process simulator and other software, a self-describing data-file format is designed and related program libraries are developed. A C++ class for solving drift-diffusion type partial-differential-equation in a three-dimensional space is developed.

• 一般社団法人電子情報通信学会の論文
• 1999-06-25

著者

• Wada Tetsunori

  Advanced Technology Research Department Semiconductor Leading Edge Technologies Inc.

• K0TANI Norihiko

  Advanced Technology Research Department, Semiconductor Leading Edge Technologies,Inc.,

関連論文

• Design and Development of 3-Dimensional Process Simulator (Special Issue on TCAD for Semiconductor Industries)

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