METROPOLE-3D : An Efficient and Rigorous 3D Photolithography Simulator (Special Issue on TCAD for Semiconductor Industries)

スポンサーリンク

概要

• 論文の詳細を見る

• In this paper we present a rigorous vector 3D lithography simulator METROPOLE-3D which is designed to run moderately fast on conventional engineering workstations. METROPOLE-3D solves Maxwell's equations rigorously in three dimensions to model how the non-vertically incident light is scattered and transmitted in non-planar structures. METOROPOLE-3D consists of several simulation modules : photomask simulator, exposure simulator, post-exposure baking module and 3D development module. This simulator has been applied to a widerange of pressing engineering problems encountered in state-of-the-art VLSI fabrication processes, such as layout printability/manufacturability analysis including reflective notching problems and optimization of an anti-reflective coating (ARC) layer. Finally, a 3D contamination to defect transformation study was successfully performed using our rigorous simulator.

• 社団法人電子情報通信学会の論文
• 1999-06-25

著者

• Strojwas Andrzej

  The Electrical And Computer Engineering Department Carnegie Mellon University

• Ll Xiaolei

  the Electrical and Computer Engineering Department, Carnegie Mellon University

• LUCAS Kevin

  Advanced Products Research and Development Lab, Motorola Inc.

• Ll Xiaolei

  The Electrical And Computer Engineering Department Carnegie Mellon University : Pdf Solutions Inc.

• Lucas Kevin

  Advanced Products Research And Development Lab Motorola Inc.

関連論文

• Efficient Transient Device Simulation with AWE Macromodels and Domain Decomposition (Special Issue on 1993 VLSI Process and Device Modeling Workshop (VPAD93))
• METROPOLE-3D : An Efficient and Rigorous 3D Photolithography Simulator (Special Issue on TCAD for Semiconductor Industries)

スポンサーリンク