FDM/WDM Couplers Using Silica Waveguide Deposited by APCVD (Special Issue On Devices, Packaging Technology, and Subsystems for the Optical Access Network)
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概要
- 論文の詳細を見る
We describe the design, fabrication, and characteristics of FDM/WDM coupler deposited by TEOS-O_3 based APCVD method on silicon substrates. Due to drastically reduced birefringence by APCVD process, completely polarization independent narrow band (100GHz) Mach-Zehnder type FDM coupler was obtained. We also fabricated 1.3/1.55μm directional coupler type WDM coupler with very low insertion loss.
- 社団法人電子情報通信学会の論文
- 1997-01-25
著者
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Hanada Tadahiko
Nec Opto-electoronics Research Labs.
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SHIMODA Tuyoshi
NEC Opto-electoronics Research Labs.
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KITAMURA Mitsuhiro
NEC Opto-electoronics Research Labs.
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NAKAMURA Sinichi
NEC 2nd Transmission Div.
関連論文
- An Optical Add-Drop Multiplexer with a Grating-Loaded Directional Coupler in Silica Waveguides (Joint Special Issue on Recent Progress in Optoelectronics and Communications)
- An Optical Add-Drop Multiplexer with a Grating-Loaded Directional Coupler in Silica Waveguides (Joint Special Issue on Recent Progress in Optoelectronics and Communications)
- FDM/WDM Couplers Using Silica Waveguide Deposited by APCVD (Special Issue On Devices, Packaging Technology, and Subsystems for the Optical Access Network)