Fabrication of Nb/AlOx/Nb Josephson Tunnel Junctions by Sputtering Apparatus with Load-Lock System (Special Section on Superconducting Devices)

概要

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We have fabricated Nb/AlOx/Nb Josephson tunnel junctions by a sputtering apparatus with a load-lock system. This sputtering apparatus had the sub chamber for preparation and the main chamber for sputtering. The substrate temperature was confirmed to be kept less than 85℃ during Nb sputtering at the deposition rate of 1.18 nm/s for 7 minutes. The junctions that had 50 μm×50 μm area successfully showed the Vm value (the product of the critical current and the subgap resistance at 2 mV) as high as 50 mV at the current density of 100 A/cm^2.
社団法人電子情報通信学会の論文
1994-08-25