The Analysis of Waveguiding Effects on the Minimum Transferable Linewidth of an Ultrafine X-Ray Mask (Special Issue on Sub-Half Micron Si Device and Process Technologies)

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概要

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• The minimum transferable linewidth by X-ray is derived using waveguide analysis. The minimum width is determined by the refractive index of the absorber and does not depend on the X-ray wavelength. Therefore there is an optimum mask aperture size which provides the minimum linewidth. By using Au as the absorber, 8 nm linewidth is attainable.

• 社団法人電子情報通信学会の論文
• 1993-04-25

著者

• Furuya Kazuhito

  Faculty Of Engineering Tokyo Institute Of Technology

• Takakuwa Masaki

  Faculty of Engineering, Tokyo Institute of Technology

• Takakuwa Masaki

  Faculty Of Engineering Tokyo Institute Of Technology

関連論文

• Calculation of the Potential Distribution around an Impurity-Atom-Wire-The Validity of the Thomas-Fermi Approximation
• The Analysis of Waveguiding Effects on the Minimum Transferable Linewidth of an Ultrafine X-Ray Mask (Special Issue on Sub-Half Micron Si Device and Process Technologies)

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