New Reactive Sputtering Model Considering the Effect of the Electron Emission Coefficiency for MgO Deposition(Special Issue on Electronic Displays)

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概要

• 論文の詳細を見る

• Reactive sputtering of a metallic target in DC planar magnetron discharge shows a drastic mode transition between metallic and oxide modes. To describe the experimental results quantitatively, a new reactive sputtering model including the secondary electron emission coefficient of a target has been developed. The model is based on a simple reactive gas balance model proposed by Berg et al. [7]-[9], and can quantitatively describe experimental results such as the oxygen flow rate dependence of deposition rate and discharge, observed for MgO sputter-deposition.

• 社団法人電子情報通信学会の論文
• 2001-11-01

著者

• Otomo K

  The Faculty Of Engineering Nagasaki University:kagoshima Matsushita Electronics Co. Ltd.

• Fujiyama Hiroshi

  The Faculty Of Engineering Nagasaki University

• MATSUDA Yoshinobu

  the Faculty of Engineering, Nagasaki University

• TASHIRO Kei

  the Faculty of Engineering, Nagasaki University

• OTOMO Koji

  the Faculty of Engineering, Nagasaki University

• Tashiro Kei

  The Faculty Of Engineering Nagasaki University

• Matsuda Yoshinobu

  The Faculty Of Engineering Nagasaki University

関連論文

• New Reactive Sputtering Model Considering the Effect of the Electron Emission Coefficiency for MgO Deposition(Special Issue on Electronic Displays)

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