A Study on AMR Properties of Ni65Co35 Thin Film

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概要

• 論文の詳細を見る

• Ni65Co35 (λs=0) thin film was prepared by RF magnetron sputtering method and themagnetoresistance(MR) ratios were measured by four-point probe method. MR properties as functions of certain sputtering parameters such as sputtering Ar pressure, bias voltage, subtrate temperature were investigated. The maximum MR ratio we obtained was 4.4%. In addition, the annealing kinetics of Ni65Co35 thin film was studied, and the thermal activation energy was obtained.

• 社団法人電子情報通信学会の論文
• 1996-11-22

著者

• Shoubai Zhang

  Information Storage Research Center, ShangHai Jiao Tong University

• Chunshen Yang

  Information Storage Research Center, ShangHai Jiao Tong University

• Juntao Xu

  Information Storage Research Center, ShangHai Jiao Tong University

• Juntao Xu

  Information Storage Research Centre Shanghai Jiaotong University

• Chunshen Yang

  Information Storage Research Centre Shanghai Jiaotong University

• Shoubai Zhang

  Information Storage Research Centre Shanghai Jiaotong University

関連論文

• Giant Magnetoresistance in CoCu Granular Alloy Films
• A Study on AMR Properties of Ni65Co35 Thin Film

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