Preparation and Read/Write Performance of Contact SCC-MIG Heads
スポンサーリンク
概要
- 論文の詳細を見る
A contact SCC-MIG gead with three contact pads was prepare by using the dry etching process, and its read/write performance was evaluated. The magnetic spacing of the contact system was estimated to be about 30nm and the bouncing height was 10nm. A D_<50> of 250 kFCI was achieved by using a gap length of 0.10μm and a track width of 1.2μm. The read/write performance can be theoretically improved by reducing the overcoat thickness and/or optimizing the gap length dependence, the read/write performance was significantly improved by using a small gap length in applications involving narrow magnetic spacing, such as contact recording.
- 社団法人日本磁気学会の論文
- 1998-04-15
著者
-
Suemitsu K
Functional Devices Research Laboratories Nec Corporation
-
Sato A
Functional Devices Research Laboratories, NEC Corporation
-
Tsuboi S
Functional Devices Research Laboratories, NEC Corporation
-
Tsukamoto Y
Functional Devices Research Laboratories, NEC Corporation
-
Takami M
R&D Center, Minebea Co., Ltd.,
-
Iwakura M
R&D Center, Minebea Co., Ltd.,
-
Kawashima S
R&D Center, Minebea Co., Ltd.,
-
Iwakura M
R&d Center Minebea Co. Ltd.