電子線描画技術
スポンサーリンク
概要
- 論文の詳細を見る
The present paper is a lecture of introduction to the technology of electron beam Lithography. It describes the need, the present state of development and some open questions of the technology. Several kinds of instruments for pattern writing of one to two micro meter linewidth are available for the mask production, and the direct pattern writing for silicon wafer is under development in general.
- 社団法人日本時計学会の論文
- 1978-12-20