Geometrical Analysis of Mask Pattern for VLSI and Application of the Technique

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概要

• 論文の詳細を見る

• An original definition is presented of four distances between two segments at any angle that are not defined in plane geometry. A definition of a nearby region within a fixed distance between two segments is also presented. These are indispensable for the checking of layout design rules pertaining to mask pattern data including diagonal edges. Using this geometrical analysis, we have developed a high performance pattern Checker, MACH(Mask Artwork CHecking program), that can detect all design rule errors and visualize them on a color graphic terminal. MACH has been applied to more than one hundred LSIs since April 1981.

• 一般社団法人情報処理学会の論文
• 1984-11-10

著者

• Sakemi Junya

  Central Research Laboratory Hitachi Ltd.

• TSUKIZOE AKIRA

  Central Research Laboratory, Hitachi, Ltd.

• KOZAWA TOKINORI

  Central Research Laboratory, Hitachi, Ltd.

• Tsukizoe Akira

  Central Research Laboratory Hitachi Ltd.

• Kozawa Tokinori

  Central Research Laboratory Hitachi Ltd.

関連論文

• Geometrical Analysis of Mask Pattern for VLSI and Application of the Technique

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