Fabrication and Comparison of Broad-band Inductors with One and Two Co-based Amorphous Ground Planes

概要

論文の詳細を見る
To address the growing need for smaller integrated passive components, inductors were fabricated with magnetic material on silicon using a standard silicon processing tool set. CoZr based alloys were targeted due to their soft magnetic properties, high crystallization temperature and compatibility with fabrication facilities. The best results measured were from inductors which exhibited 〜 60% increase in inductance for a single layer of 1.0μm of CoTaZr. Sandwiched inductors with 0.4pm of CoTaZr above and below the planar spiral show enhancement of 〜100%. Inductors with CoNbZr were also fabricated, however, the magnetic properties degraded during high temperature processing. Finally, the effective permeability of the CoTaZr inductors was estimated to be 〜 85-150 depending on the device geometry.
社団法人日本磁気学会の論文
2002-12-01