504 Commercial Femtosecond Micromachining System for Sub-micron/sub-millimeter Scale Patterning

スポンサーリンク

概要

• 論文の詳細を見る

• Commercial femtosecond micromachining system (FMS) has been developed that capable to process material in sub-micron (<200nm), micron and millimeter scale. The system structure and capabilities are presented. Basic functions of the system performance are controlled by sophisticated software. The files prepared with standard software can be acceptable for pattern fabrication. The results obtained by FMS are presented and discussed : bits in the range of 100-200 nm sizes, 6 TB/cm^3 density optical storage matrix, waveguides fabrication inside transparent materials, high aspect ratio (1 : 125) patterning of dielectric materials with Bessel beam, micro-drilling, micro-cutting and micro-pattern formation in the range of tens of millimeters.

• 社団法人日本機械学会の論文

著者

• Kononov V.

  Lotis Tii

• Vanagas E.

  Tokyo Instruments, Inc.

• Tuzhilin D.

  Tokyo Instruments, Inc.

• Zinkou M.

  LOTIS TII

• Sedunov A.

  LOTIS TII

• Vasiliev N.

  LOTIS TII

• Kudryashov I.

  Tokyo Instruments, Inc.

• Suruga S.

  Tokyo Instruments, Inc.

• Vanagas E.

  Tokyo Instruments Inc.

• Tuzhilin D.

  Tokyo Instruments Inc.

• Kudryashov I.

  Tokyo Instruments Inc.

• Suruga S.

  Tokyo Instruments Inc.

関連論文

• 504 Commercial Femtosecond Micromachining System for Sub-micron/sub-millimeter Scale Patterning
• (励起子・ポラリトン・表面・薄膜,領域5)

スポンサーリンク