123 A Method for Liquid Surface Unevenness Measurement in Stereolithography

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概要

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• Unevenness on a resin liquid surface is one of the factors that precision in the stereolithography decreases. When there is unevenness on a resin liquid surface, it result in uneven thickness, and the forming precision decreases. The conventional stereolithography apparatus are equipped with a leveling device to prevent unevenness on a liquid surface. However, whether the liquid surface is flat, doesn't measure at present. Because of that, it is difficult to make liquid surface to be always flat. This paper proposes a method to measure a uneven liquid surface. An influence on the measurement error of each factor was analyzed. An actual uneven surface shape was measured, and measurement precision was examined. The possibility of the application to Stereolithography was examined from the analysis and the result of the actual measurement. It became clear that the unevenness of 6 microns could be measured with developed equipment.

• 一般社団法人日本機械学会の論文

著者

• Narahara H.

  Kyushu Institute Of Technology Department Of Mechanical Systems Engineering

• Suzuki H.

  Kyushu Institute of Technology

• Yoshikawa A.

  Kyushu Institute of Technology, Department of Mechanical Systems Engineering

関連論文

• 433 An Application of Boundary-Map Geometric Model to the Multi-axis NC Simulator
• 123 A Method for Liquid Surface Unevenness Measurement in Stereolithography

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