D304 MOLECULAR DYNAMICS STUDY ON EVAPORATION PROCESS OF ADHERED THIN FILM ON SURFACE BY HIGH TEMPERATURE GAS(Molecular dynamics)
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概要
- 論文の詳細を見る
In order to understand thermal phenomena on evaporation processes of adhered molecules by using high temperature gas like burnt gas, evaporation processes of adhered molecules on surface molecules are calculated by the molecular dynamics method. Effects of adhered molecular thickness and surface potential energy on evaporation rate of adhered molecules and molecular evaporation mechanism are investigated and discussed in the present study. The calculation system is composed of a high temperature gas region, an adhered molecular region and a surface molecular region. Both the thickness of adhered molecules and potential parameters affect the evaporation rate of adhered molecules and evaporation mechanism in molecular scale.
- 一般社団法人日本機械学会の論文
- 2000-10-01
著者
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SHIBAHARA Masahiko
Department of Mechanical Engineering, Osaka University
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Katsuki Masashi
Department Of Mechanical Engineering Faculty Of Engineering Osaka University
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Shibahara Masahiko
Department Of Mechanical Engineering Osaka University
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KADOSAKA Osamu
Graduate School of Engineering, Osaka University
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Kadosaka Osamu
Graduate School Of Engineering Osaka University
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KATSUKI Masashi
Department of Mechanical Engineering, Osaka University
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