609 超硬ナロコンポジット薄膜の低温合成
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概要
- 論文の詳細を見る
An inductively coupled plasma (ICP) was sustained by an internal antenna with insulting covering to assist dc magnetron sputtering. This incorporated a high-density low-energy ion flux to bombard the growing film on grounded Si (100) substrate. Thus, superhard nanocomposite Ti-Si-N and Ti-Cu-N thin films with low residual stress were synthesized at low deposition temperature. Form XRD, TEM and XPS, it was assumed that nc-TiN/a-Si_3N_4 and nc-TiN/nc-Cu nanocomposites were formed, respectively. TiN was composed of nanocrystallite of approximately 20-30 nm. Film hardness strongly depended on the content of Si or Cu, and reached a value higher than 40 GPa in both cases. Hardness enhancement by the addition of Si or Cu could be attributed to nanocomposite effect.
- 一般社団法人日本機械学会の論文
- 2003-10-17
著者
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Li Z.
Jwri Osaka University
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Li Z.
JWRI, Osaka University
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Mori M.
JWRI, Osaka University
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Saito H.
KTF
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Muramatsu Y.
KTF
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Miyake S.
JWRI, Osaka University