反応性スパッター法によるSnO_2薄膜のガス感度

概要

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Tin oxide(SnO_2)films were deposited by r.f.(Radio Frequency)magnetron reactive sputtering and subsequently annealed at 900℃. The effect of deosition parameters and Pt catalyst content on phases and gas sensitivity of the SnO_2 films were investigated. It was shown that the amorphous phase disappeared, polycrystalline SnO_2 formed after heat treatment, and the crystallinity of SnO_2 reduced with decreasing oxygen flow rate. The gas sensitivity of tin oxide films deposited at 50 sccm was consistently higher than that of 25 sccm and invariably increased with the CO concentration. The sensitivity of Pt doped SnO_2 films was, however, much superior to that of undoped samples. In addition, the sensitivity consistently decreased with the amount of Pt.
社団法人日本セラミックス協会の論文
2002-01-01