炭素鋼にディップコーティングしたTiO_2膜の窒素ガス中加熱によるTiN膜の生成

概要

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TiO_2 coating films prepared by dip-coating of various substrates with Ti(OC_3H_7^i)_4/cyclohexane solution were heated in a flow of N_2 gas below 1080℃ for one hour. After this heat treatment, TiN coating obtained from TiO, was investigated by XRD, ESCA, TEM, EDS and UTW-EDS. TiN formed on carbon steel substrates(C content ; 0.04-1.0 wt%). On the carbon steel substrate(C content ; 0.48 wt%) , MnTiO_3 and Ti_2O_3 formed by the reaction of TiO_2 with a small amount of Mn contained in substrates above 〜 580℃, and then changed to TiN in a flow of N_2 at > 780℃. However, MnTiO_3 or Ti_2O_3 on the decarburized carbon steel(C content ; 0.005 wt% ) was not converted to TiN. TiN was not observed on other substrates such as silica glass, Si wafer, SUS_<444>, Ni, Mo and Pt.
社団法人日本セラミックス協会の論文
1990-12-01