RuO_2を接合層に用いたAl_2O_3基板上のAu薄膜の熱安定性
スポンサーリンク
概要
- 論文の詳細を見る
The effect of RuO_2 thin films on stabilizing the thermal properties of Au thin films deposited on Al_2O_3 substrates was investigated. Dependencies on temperature of both sheet resistance and adhesion strength were measured. The adhesion strength of the Au/RuO_2 system was constant with temperature. while that of the Au/Pt/Ti system decreased as increasing temperature beyond 400℃. The adhesive properties of the Au/RuO_2 system were not influenced by heating and stable up to 800℃. The sheet resistance of the Au/RuO_2 system remained constant up to 700℃. The RuO_2 thin films can operate as heat-resisting adhesion layers in Au thin films. Au thin films were highly oriented in the Au(111) plane.
- 2001-06-01
著者
関連論文
- NiO-Li_2CO_3検知極とLi_2TiSiO_5を用いた炭酸ガスセンサー
- Li_2CO_3-La_Si__6O_を検知極に用いた固体電解質型炭酸ガスセンター
- リチウムイオン伝導体Li_2TiSiO_5を利用した炭酸ガスセンサ
- RuO_2を接合層に用いたAl_2O_3基板上のAu薄膜の熱安定性