THERMAL STABILITY OF RF-SPUTTERED AMORPHOUS FILMS IN COMPARISON WITH GELS IN THE SiO_2-ZrO_2 SYSTEM
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概要
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Amorphous-forming regions in the RF-sputtered SiO_2-ZrO_2 films determined by X-ray diffraction were in the range 0-70mol%ZrO_2 under sputtering power 50W, sputtering time 15h and in the range 0-68mol%ZrO_2 under sputtering power 100W, sputtering time 25h with Ar/O_2=3 atmosphere. Crystallization temperatures, T_C, measured by DTA on the sputtered films decreased with increasing ZrO_2 content. From the liquidus temperature, T_L, of the system the thermal stability of the sputtered films was evaluated in terms of T_C/T_L ratio, which means the amorphous-forming ability, ability of the system to form an amorphous phase. T_C/T_L ratio decreased with increasing ZrO_2 content from 0.81(0mol%ZrO_2)to 0.36(69.1mol%ZrO_2)in the sputtered films. Gels of the SiO_2-ZrO_2 system were prepared from Si(OC_2H_5)_4 and Zr(OC_3H_7)_4 ethanol solution with or without water addition in the range 0-100mol%ZrO_2. T_C was measured on dried and calcined gels by DTA. The thermal stability, T_C/T_L, of gels was found to decrease from 0.77(0mol%ZrO_2)to 0.23(100mol%ZrO_2). The compositional dependence of T_C/T_L ratios of gels was almost comparative with those of the sputtered films, implying that amorphous-forming ability is intrinsic to the system.
- 社団法人日本材料学会の論文
- 1999-03-15
著者
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WAKASUGI Takashi
Department of Chemistry and Materials Technology, Faculty of Engineering and Design, Kyoto Institute
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Ota R
Department Of Chemistry And Materials Technology Faculty Of Engineering And Design Kyoto Institute O
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Ota Rikuo
Department Of Chemistry And Materials Technology Kyoto Institute Of Technology
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Fukunaga J
Department Of Chemistry And Materials Technology Kyoto Institute Of Technology
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Wakasugi T
Kyoto Inst. Technol. Kyoto‐shi
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WANNAGON Anucha
Department of Chemistry and Materials Technology, Kyoto Institute of Technology
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HORAI Toshiyuki
Department of Chemistry and Materials Technology, Kyoto Institute of Technology
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ITAKURA Tetsuso
Department of Chemistry and Materials Technology, Kyoto Institute of Technology
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FUKUNAGA Jiro
Department of Chemistry and Materials Technology, Kyoto Institute of Technology
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Wakasugi Takashi
Department Of Chemistry And Materials Technology Kyoto Institute Of Technology
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Itakura Tetsuso
Department Of Chemistry And Materials Technology Kyoto Institute Of Technology
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Wannagon A
Department Of Chemistry And Materials Technology Kyoto Institute Of Technology
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Horai Toshiyuki
Department Of Chemistry And Materials Technology Kyoto Institute Of Technology
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Wakasugi Takashi
Daiichi Kigenso Kagaku Kogyo Co., Ltd.
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WAKASUGI Takashi
Department of Physics, Osaka City University
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