27aY-10 Structure analysis of single crystalline SiO_2 film on Ni(111) by GIXD
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概要
- 論文の詳細を見る
- 社団法人日本物理学会の論文
- 1999-09-03
著者
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Kundu Manisha
Physics Department The University Of Electro-communications
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Tajiri Hiroo
ISSP, The University of Tokyo
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Wataru Yasuhiro
ISSP, The University of Tokyo
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Shimizu Keisuke
ISSP, The University of Tokyo
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Takahashi Toshio
ISSP, The University of Tokyo
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Murata Yoshitada
Physics Department, The University of Electro-Communications
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Tajiri Hiroo
Issp The University Of Tokyo
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Wataru Yasuhiro
Issp The University Of Tokyo
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Murata Yoshitada
Physics Department The University Of Electro-communications
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Shimizu Keisuke
Issp The University Of Tokyo
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Takahashi Toshio
Issp The University Of Tokyo
関連論文
- 27aY-10 Structure analysis of single crystalline SiO_2 film on Ni(111) by GIXD
- 24pPSA-34 Theoretical study of the initial oxidation of the SiC(0001) surface